Chromium Silicide, CrSi2

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Chromium Silicide, CrSi2

Application of chromium disilicide in the preparation of ceramic materials by pyrolysis of Polycarbosilane as precursor Chromium disilicide powder can promote the cracking reaction of PCs,  increase the ceramic yield of the precursor, reduce the linear shrinkage of the  precursor in the pyrolysis process, and improve the properties of ceramic materials.


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Chromium disilicide

Application of chromium disilicide in the preparation of ceramic materials by pyrolysis of Polycarbosilane as precursor Chromium disilicide powder can promote the cracking reaction of PCs, increase the ceramic yield of the precursor, reduce the linear shrinkage of the precursor in the pyrolysis process, and improve the properties of ceramic materials. The main uses of chromium silicide are as follows It can be used as ceramic material and high resistance film material.The product properties of chromium silicide are as follows Chromium silicide film has high resistivity and low resistance temperature coefficient. Gray cubic crystal, hexagonal system, melting point close to 1550 ℃, the bonding form in crystal is similar to Cr3Si, metallic luster, insoluble in hydrochloric acid and aqua regia.Chromium silicide film has high resistivity and low resistance temperature coefficient.


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